Master in Human Resource Management

The University of Nairobi is a leading African institution founded in 1970 and located in Kenya's capital, Nairobi. With around 84,000 students including roughly 1,200 international learners, the university offers a broad range of programs across health sciences, engineering, business, humanities, and development studies. Its long history and strong research profile make it a hub for regional scholarship and professional training.

UoN emphasizes applied research and community engagement, hosting institutes that tackle environmental, health, and development challenges. International students benefit from a multicultural campus, partnerships with international organizations, and hands-on learning opportunities that connect theory to practice. Support services through the International Office help with admissions, visas, and orientation to Kenyan academic and social life.

On-campus housing is available with varying costs and options; applying well in advance is recommended to secure accommodation. The university's position in Nairobi provides access to internships, NGOs, and a growing tech and business sector, making it attractive for students seeking meaningful research, regional networks, and practical experience in East Africa.

The Master in Human Resource Management at the University of Nairobi is a 2-year Master's degree for human resource professionals. This program enhances skills and competencies, enabling graduates to contribute strategically to business success.

The curriculum covers various management disciplines, including practical experiences and discussions that enrich students' understanding of human resource management. Students develop skills in business and human resource strategies, preparing them to tackle global challenges.

Graduates can pursue careers as Human Resources Managers, HR Consultants, and Organizational Development Specialists. They can work in various sectors, applying their skills to enhance employability and career advancement opportunities.